3M seals agreement with Lotus Applied Technology for ALD Barrier Technology

3M has entered into a licensing agreement with Lotus Applied Technology to access Lotus’s TransFlexALDTM spatial Atomic Layer Deposition (ALD) and barrier materials patent portfolio.

TransFlexALD technology enables high-speed, low-cost deposition of single layer “ultra-barrier” coatings on rolls of polymer film using ALD. These coatings play a critical role in the encapsulation of moisture- and oxygen-sensitive electronics, such as OLED (organic light emitting device) lighting and displays, quantum dot films, photovoltaics, and flexible electronics.

3M is a leading manufacturer of flexible, transparent ultra barrier films providing encapsulation solutions for display (3M Flexible Transparent Barrier Film) and other sensitive electronic applications.