New ultra-high temperature annealing system

ULVAC-RIKO Inc. announced the entry of its High Temperature Rapid Thermal Annealing System into the market this month. Capable of heating up to 1,800°C within 10 seconds, the HT-RTA59HD addresses the need for ultra-high temperature for annealing requirements. 

The HT-RTA59HD features a high-power spot focused infrared gold image furnace on-board for heating precious materials such as SiC and small materials with high melting points.  It has a cold wall for rapid heating and cooling.  The temperature data can be inputted easily through a USB connection and can be displayed on the computer monitor even during heating. One line of N₂ gas flow meter is available as standard equipment.

The Ulvac-Riko annealing system supports a maximum 2,000°C. It uses a JIS thermocouple type B temperature control sensor and two 3.5kW 200VAC infrared lamps. 

The HT-RTA59HD measures approximately 410mmx450mmx840mm without any protrusion. It weighs about 45kg and runs on 200VAC 40A 8kW. It is expected to sell from JPY 6,500,000 yen (USD 55,900).

Applications include oxide film formation in SiC(GaN) power device processes, research and development of activation annealing and semiconductor process, and heat treatment of glass substrates, ceramics, and composite materials. The HT-RTA59HD is also suitable for thermal shock tests of ceramics materials and various heat treatment tests such as sintering of metal materials with high melting points. It can be used as a temperature gradient furnace or a heating furnace for gas analysis.